• 21 July 2021
    Johannes Fiedler (UiB) presented a contribution to the FOMO lecture series (Lectures on Matter-Wave Interferometry) on July 21st 2021. Title: The role of dispersion forces in matter-wave scattering experiments Abstract: Dispersion forces, such as van der Waals forces between neutral particles or Casimir-Polder forces between neutral particles and dielectric surfaces, are caused by the ground-state fluctuations of the electromagnetic field. They can be understood via an exchange of virtual photons that are generated as a dipole response of the particle due to the vacuum fluctuation of the field surrounding it. These resulting forces are weak for large separations and dramatically increase with decreasing distances. To this end, in matter-wave scattering experiments, where the beam particles reach close distances to the diffracted object, which is typical in the order of a few nanometers, these forces dominate the interaction and have a large impact on the experimental results. In this talk, we will shortly introduce these forces and illustrate their impact on the diffraction of particle beams from porous materials. This is of particular relevance for  metastable atom lithography with binary holography masks, currently pursued in the FET-Open project Nanolace.   Link to the abstract:
  • 21 July 2021
    Veronica Perez (NTNU) presented a contribution to the FOMO lecture series (Lectures on Matter-Wave Interferometry) on July 21st 2021. Title: The NanoLace project: Grid-based holograms for matter waves lithography Abstract: Grid-based binary holography (GBH) is an attractive method for patterning with light or matter waves. It is an approximate technique in which different holographic masks can be used to produce similar patterns. Mask-based pat- tern generation is a critical and costly step in microchip production. The next- generation extreme ultraviolet- (EUV) lithography instruments with a wave- length of 13.5 nm are currently under development. In principle, this should allow patterning down to a resolution of a few nanometers in a single expo- sure. However, lithography with metastable atoms has been suggested as a cost-effective, less-complex alternative to EUV lithography. The great advan- tage of atom lithography is that the kinetic energy of an atom is much less than that of a photon for the same wavelength. Until now, however, no method has been available for making masks for atom lithography that can produce arbitrary, high-resolution patterns; to achieve this is the aim of the NanoLace project. Here we present the resolution that can be achieved when making binary masks to create patterns in a target plane close to the mask with the use of an atom source. Through simulations, we investigate the diffraction and ideal size of the patterns formed by holographic masks using beams of room temperature metastable helium atoms. in an experimental setup. Our calculations are now being extended to consider all experimental key features.   Link to the abstract:  
  • 09 March 2021
    Project Coordinator Bodil Holst presented Nanolace at the Innovation Norway Launch of the Horizon Europe - Pillar III Innovation Europe, which took place as a virtual event on the 9.march 9.00-11.00, with participation of the Norwegian ministers for research and higher education Henrik Aasheim and the minister of Trade and Industry Iselin Nybø
  • 18 September 2020
    Bodil Holst gave an invited talk: “Can Matter Waves Save Moore?” in the Plenary Session – The end of Moore’s Law; the future is bright, where she presented the Nanolace Project.
  • 27 October 2020
    Coming soon!