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<oembed><version>1.0</version><provider_name>nanoLace</provider_name><provider_url>https://www.nanolace.eu</provider_url><author_name>admin</author_name><author_url>https://www.nanolace.eu/author/admin/</author_url><title>About &raquo; nanoLace</title><type>rich</type><width>600</width><height>338</height><html>&lt;blockquote class="wp-embedded-content"&gt;&lt;a href="https://www.nanolace.eu/about/"&gt;About&lt;/a&gt;&lt;/blockquote&gt;
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&lt;/script&gt;&lt;iframe sandbox="allow-scripts" security="restricted" src="https://www.nanolace.eu/about/embed/" width="600" height="338" title="&#x201C;About&#x201D; &#x2014; nanoLace" frameborder="0" marginwidth="0" marginheight="0" scrolling="no" class="wp-embedded-content"&gt;&lt;/iframe&gt;</html><description>PROJECT DESCRIPTION The ability to pattern materials at ever-smaller sizes using photolithography is driving advances in nanotechnology. When the feature size of materials is reduced to the nanoscale, individual atoms and molecules can be manipulated to dramatically alter material properties. So far the highest-resolution mask-based photolithography can generate patterns down to around 20 nm. Extreme [&hellip;]</description></oembed>
